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nanoseparations

Achieving nanoscale horizontal separations in the standard 2 μm PolyMUMPS process

1 min read · Tue, Apr 29 2014

News

Circuits PolyMUMPS nanoseparations

Amro M Elshurafa, et al., "Achieving nanoscale horizontal separations in the standard 2 μm PolyMUMPS process." Applied Nanoscience 4 (2), 2014, 241. This paper shares with the research community how to achieve, effectively and easily, lateral submicron separations in the standard 2 μm PolyMUMPS process without any fabrication intervention or post-processing, based on the oxide sidewall spacer technique. Thousands of nanoseparations were created and successfully tested by visual inspection and by a simple capacitance measurement. The lateral separations attained were less than 440 nm and

Communication and Computing Systems Lab (CCSL)

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